2112
Effective Defect Control in TiN Metal Hard Mask Cu/Low-k Dual Damascene Process

Tuesday, October 29, 2013: 11:00
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Alexander Kabansky, PhD , Lam Research Corporation, Santa Clara, CA
Samantha S.H. Tan, PhD , Lam Research Corporation
Eric A. Hudson, PhD , Lam Research Corporation
Gerardo Delgadino, PhD , Lam Research Corporation
Lajos Gancs, PhD , Lam Research Corporation
Jeffrey Marks, PhD , Lam Research Corporation

Abstract:

  • E8-2112 (167.0KB) - Abstract Text
See more of: FEOL & BEOL Cleaning
See more of: E8: Semiconductor Cleaning Science and Technology 13 (SCST 13)
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
<< Previous Abstract | Next Abstract >>