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(Invited) Origins for Fermi Level Control in Metal/High-k/Si Stacks with Inserted Dielectric Layers

Monday, October 28, 2013: 11:10
Union Square 22, Tower 3, 4th Floor (Hilton San Francisco Union Square)
Moshe Eizenberg , Technion - Israel Institute of Technology, Haifa, Israel
Lior Kornblum , Technion - Israel Institute of Technology

Abstract:

See more of: Defects, Traps, and Reliability
See more of: E10: Semiconductors, Dielectrics, and Metals for Nanoelectronics 11
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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