2095
(Invited) Particle Cleaning Technologies to Meet Advanced Semiconductor Device Process Requirements

Monday, October 28, 2013: 10:00
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Harald F. Okorn-Schmidt , Lam Research AG, Villach, Austria
Frank Holsteyns , Lam Research AG
Alexander Lippert , Lam Research AG
David Mui , Lam Research
Mark Kawaguchi , Lam Research
Christiane Lechner , Institute of Fluid Mechanics and Heat Transfer, Vienna University of Technology, A-1040 Vienna, Austria
Philipp E. Frommhold , Christian-Doppler-Laboratory for Cavitation and Micro-Erosion, Drittes Physikalisches Institut Georg-August-Universität Göttingen, D-37077 Göttingen, Germany
Till Nowak , Christian-Doppler-Laboratory for Cavitation and Micro-Erosion, Drittes Physikalisches Institut Georg-August-Universität Göttingen, D-37077 Göttingen, Germany
Robert Mettin , Christian-Doppler-Laboratory for Cavitation and Micro-Erosion, Drittes Physikalisches Institut Georg-August-Universität Göttingen, D-37077 Göttingen, Germany

Abstract: