2126
Non-Stiction Performance of Various Post Wet-Clean Drying Schemes on High-Aspect-Ratio Device Structures

Tuesday, October 29, 2013
Grand Ballroom, Tower 2, Grand Ballroom Level (Hilton San Francisco Union Square)
Han-Wen Chen, Ph.D , Applied Materials, Inc., Santa Clara, CA
Roman Gouk , Applied Materials, Inc.
Steven Verhaverbeke , Applied Materials, Inc.
Robert J. Visser , Applied Materials, Inc.

Abstract:

  • E8-2126 (1432.7KB) - Abstract Text
See more of: Poster
See more of: E8: Semiconductor Cleaning Science and Technology 13 (SCST 13)
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
<< Previous Abstract | Next Abstract >>