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FTIR-ATR Study on Near-Interface Structure of Thermal Oxides on 4H-SiC Substrates

Wednesday, October 30, 2013: 14:30
Union Square 22, Tower 3, 4th Floor (Hilton San Francisco Union Square)
Hirohisa Hirai , The University of Tokyo
Koji Kita, PhD , JST-PRESTO, Tokyo, Japan

Abstract:

See more of: Characterization
See more of: E10: Semiconductors, Dielectrics, and Metals for Nanoelectronics 11
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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