Characterization

Wednesday, October 30, 2013: 13:40-15:30
Union Square 22, Tower 3, 4th Floor (Hilton San Francisco Union Square)
Chairs:
Valery V. Afanas'ev and Koji Kita, PhD
13:40
2184
Measurement of Complex Conductance in the PHz Frequency Range with Subnanometric Spatial Resolution: Application to the Grain Boundary of Monoclinic Hafnia
Cyril Guedj, PhD., Habilitation to Supervise Research, CEA, LETI, MINATEC Campus
14:00
2185
(Invited) Electron Band Alignment at Ge/Oxide and  AIII-BV/Oxide Interfaces from Internal Photoemission Experiments
Valery V. Afanas'ev, University of Leuven; Hsing- Yi Chou, MSc, University of Leuven; Michel Houssa, University of Leuven; Andre Stesmans, Dr., University of Leuven
14:30
2186
FTIR-ATR Study on Near-Interface Structure of Thermal Oxides on 4H-SiC Substrates
Hirohisa Hirai, The University of Tokyo; Koji Kita, PhD, JST-PRESTO
14:50
2187
Investigation on Oxygen Diffusion in a High-k Metal-Gate Stack for Advanced CMOS Technology by XPS
Ardem Kechichian, Chimie ParisTech; Philippe Barboux, Chimie ParisTech; Mickael Gros-Jean, STMicroelectronics
15:10
2188
Lateral Nonuniformity of the Tunneling Current of Al/SiO2/p-Si Capacitor in Inversion Region Due to Edge Fringing Field Effect
Han-Wei Lu, PhD student, National Taiwan University; Jenn-Gwo Hwu, PhD, National Taiwan University
See more of: E10: Semiconductors, Dielectrics, and Metals for Nanoelectronics 11
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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