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Investigation on Oxygen Diffusion in a High-k Metal-Gate Stack for Advanced CMOS Technology by XPS

Wednesday, October 30, 2013: 14:50
Union Square 22, Tower 3, 4th Floor (Hilton San Francisco Union Square)
Ardem Kechichian , Chimie ParisTech, Grenoble, France
Philippe Barboux , 11 rue Pierre et Marie Curie, Chimie ParisTech, Paris, France
Mickael Gros-Jean , STMicroelectronics

Abstract:

See more of: Characterization
See more of: E10: Semiconductors, Dielectrics, and Metals for Nanoelectronics 11
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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