1899
Influence of Ion Implantation in SiC on the Channel Mobility in Lateral N-Channel MOSFETs

Monday, October 28, 2013: 10:40
Continental 9, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Christian Strenger , The Wide Bandgap Semiconductor Alliance (WISEA), Erlangen, Germany
Viktoryia Uhnevionak , The Wide Bandgap Semiconductor Alliance (WISEA), Erlangen, Germany
Alex Burenkov , The Wide Bandgap Semiconductor Alliance (WISEA)
Anton Bauer , The Wide Bandgap Semiconductor Alliance (WISEA)
Peter Pichler , Chair of Electron Devices University Erlangen-Nuremberg
Tobias Erlbacher , Chair of Electron Devices University Erlangen-Nuremberg
Heiner Ryssel , Fraunhofer Institute for Integrated Systems and Device Technology
Lothar Frey , Fraunhofer Institute for Integrated Systems and Device Technology

Abstract: