2232
(Invited) Development of Metal Source/Drain Ge-CMOS Using TiN/Ge and HfGe/Ge Contacts

Tuesday, October 29, 2013: 14:30
Continental 7, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Hiroshi Nakashima , Kasuga-koen 6-1, Kyushu University, Kasuga, Japan
Keisuke Yamamoto , Kasuga-koen, 6-1, Kyushu University, Kasuga, Japan
Dong Wang , Kyushu University

Abstract:

See more of: Ge-based Technologies
See more of: E12: ULSI Process Integration 8
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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