Metallic Contamination

Monday, October 12, 2015: 13:30-14:40
104-A (Phoenix Convention Center)
Chairs:
Jin-Goo Park and Koichiro Saga
13:30
1016
(Invited) Metallic Contamination Control in Advanced ULSI Processing
K. Saga (Sony Corporation)
14:00
1017
Prevention of Metal Contamination in Sub 50 Nm SC1 Cleaning Process
H. T. Kim, G. H. Park, B. J. Cho, J. H. Lee, M. S. Kim, J. Y. Kim (Hanyang University), and J. G. Park (Hanyang University)
14:20
1018
Behavior of Nickel Deposition on Silicon Wafers from TMAH and Ammonia based SC1 Cleaning Process
D. Sinha (Self)
See more of: G02: Semiconductor Cleaning Science and Technology 14 (SCST 14)
See more of: Electronic Materials and Processing
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