G02 Semiconductor Cleaning Science and Technology 14 (SCST 14)

Lead Organizer: Takeshi Hattori (Hattori Consulting International)

Co-organizers: Jerzy Ruzyllo (The Pennsylvania State University) , Paul W Mertens (imec vzw) and Richard E Novak (Novak Consulting)

Monday, October 12, 2015

Monday | Tuesday | Wednesday | top

09:40-10:30


Welcome and Keynote
104-A
Chair(s): Jerzy Ruzyllo and Richard E Novak

10:30-12:00


Water and Chemicals
104-A
Chair(s): Srini Raghavan and Richard E Novak

13:30-14:40


Metallic Contamination
104-A
Chair(s): Jin-Goo Park and Koichiro Saga

14:40-16:00


Particle Removal
104-A
Chair(s): Koichiro Saga and Jin-Goo Park

Tuesday, October 13, 2015

Monday | Tuesday | Wednesday | top

09:00-11:00


Wafer Drying-Related Issues
104-A
Chair(s): Steven Verhaverbeke and Paul W Mertens

11:00-15:40


Wet Etching and Related Topics
104-A
Chair(s): Kurt Wostyn and Steven Verhaverbeke

15:40-17:30


BEOL Cleaning
104-A
Chair(s): Kanwaljit Singh and Kurt Wostyn

18:00-20:00


G02 Poster Session
West Hall 1

Wednesday, October 14, 2015

Monday | Tuesday | Wednesday | top

09:00-12:30


Non-Silicon Materials: Etching, Cleaning, and Conditioning
104-A
Chair(s): Paul W Mertens and Anthony J. Muscat