Particle Removal

Monday, October 12, 2015: 14:40-16:00
104-A (Phoenix Convention Center)
Koichiro Saga and Jin-Goo Park
Submicron Particle Removal during FPD Oxide TFT Process
J. Lee, M. S. Kim, H. T. Kim (Hanyang University), I. C. Choi (Hanyang University), W. Y. Kim (LG Display), D. S. Lim (LG Display), and J. G. Park (Hanyang University)
Effect of Particle Contamination on Extreme Ultraviolet (EUV) Mask and Megasonic Cleaning Process for Its Removal
M. S. Kim, H. R. Ji (Hanyang Univerisy), I. C. Choi, H. T. Kim, S. H. Jang, J. Lee, I. S. Kim, J. H. Kim, H. K. Oh, J. H. Ahn (Hanyang University), and J. G. Park (Hanyang University)
Removing Organic Residues Using Backside Brush Scrubber Clean
K. N. Chauhan, V. Sih, T. Bhat, M. H. Kang, E. Kabutoya (GLOBALFOUNDRIES Inc.), and G. Cheng (GLOBALFOUNDRIES Inc.)