Particle Removal

Monday, October 12, 2015: 14:40-16:00
104-A (Phoenix Convention Center)
Chairs:
Koichiro Saga and Jin-Goo Park
14:40
1019
Contamination Specifications, an Overall Perspective
P. W. Mertens (imec vzw)
15:00
1020
Submicron Particle Removal during FPD Oxide TFT Process
J. Lee, M. S. Kim, H. T. Kim (Hanyang University), I. C. Choi (Hanyang University), W. Y. Kim (LG Display), D. S. Lim (LG Display), and J. G. Park (Hanyang University)
15:20
1021
Effect of Particle Contamination on Extreme Ultraviolet (EUV) Mask and Megasonic Cleaning Process for Its Removal
M. S. Kim, H. R. Ji (Hanyang Univerisy), I. C. Choi, H. T. Kim, S. H. Jang, J. Lee, I. S. Kim, J. H. Kim, H. K. Oh, J. H. Ahn (Hanyang University), and J. G. Park (Hanyang University)
15:40
1022
Removing Organic Residues Using Backside Brush Scrubber Clean
K. N. Chauhan, V. Sih, T. Bhat, M. H. Kang, E. Kabutoya (GLOBALFOUNDRIES Inc.), and G. Cheng (GLOBALFOUNDRIES Inc.)
See more of: G02: Semiconductor Cleaning Science and Technology 14 (SCST 14)
See more of: Electronic Materials and Processing
<< Previous Session | Next Session >>