Water and Chemicals

Monday, October 12, 2015: 10:30-12:00
104-A (Phoenix Convention Center)
Chairs:
Srini Raghavan and Richard E Novak
10:30
1012
(Invited) Ultrapure Water for Advance Semiconductor Manufacturing: Challenges and Opportunities
S. Libman (Balazs NanoAnalysis), D. Wilcox (Samsung Austin Semiconductor), and B. Zerfas (IBM Microelectronics)
11:00
1013
Oxygen Control Challenge for Advanced Wet Processing
Y. Yoshida (SCREEN Semiconductor Solutions Co. Ltd., imec), M. Otsuji, H. Takahashi (SCREEN Semiconductor Solutions Co. Ltd.), J. Snow (SCREEN Semiconductor Solutions Co. Ltd.), F. Sebaai, F. Holsteyns (imec), P. W. Mertens (imec), M. Sato, H. Shirakawa (SCREEN Semiconductor Solutions Co. Ltd.), and H. Uchida (SCREEN Semiconductor Solutions Co. Ltd.)
11:20
1014
Effects of Diluted-NH4OH as Conductive Rinse Water in Single Wafer Cleaning Processes
Y. Hayashi, M. Kawakami, D. Yano (Organo Corporation), and K. Yamanaka (Organo Corporation)
11:40
1015
Sulfate Adsorption onto and Desorption from Silicon Dioxide Films
B. Wu (University of Arizona) and S. Raghavan (University of Arizona)
See more of: G02: Semiconductor Cleaning Science and Technology 14 (SCST 14)
See more of: Electronic Materials and Processing
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