BEOL Cleaning

Tuesday, October 13, 2015: 15:40-17:30
104-A (Phoenix Convention Center)
Chairs:
Kanwaljit Singh and Kurt Wostyn
 
1034
(Invited) Nano-Controlled Etching of Polycrystalline Metals - a Key Enabler for Future Technologies (Cancelled)
16:20
1035
Dual-Fluid Spray Process for Particle and Fluorocarbon-Polymer Removal in BEOL Applications
A. Iwasaki, A. Higuchi, K. Komori, M. Sato (SCREEN Semiconductor Solutions Co., Ltd.), and H. Shirakawa (SCREEN Semiconductor Solutions Co., Ltd.)
16:40
1036
Development of a Cu and W Compatible PERR Clean in BEOL Advanced Interconnect Patterning
E. Kesters, Q. T. Le (imec), S. Decoster, V. Vega Gonzalez (IMEC), F. Holsteyns (imec), and S. De Gendt (imec)
 
1037
Effect of Dissolved Oxygen on the Removal of BTA from Cu By Tetra Methyl Ammonium Hydroxide (Cancelled)
17:20
Poster Introduction
See more of: G02: Semiconductor Cleaning Science and Technology 14 (SCST 14)
See more of: Electronic Materials and Processing
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