G02 Poster Session

Tuesday, October 13, 2015: 18:00-20:00
West Hall 1 (Phoenix Convention Center)
1038
Surface Cleaning of SiGe(100) and Passivation of Ge(100) with Aqeuous Ammonium Sulfide
S. L. Heslop (University of Arizona), P. Engesser (Lam Research AG), H. F. Okorn-Schmidt (Lam Research AG), and A. J. Muscat (University of Arizona)
1039
Evaluation of InGaAs and InP Compatibility with Alkaline Photoresist Stripping Formulations
G. Westwood (Avantor Performance Materials)
1040
Optimizing Middle of Line (MoL) Contact Cleaning to Preserve Tungsten (W) Integrity in Advanced Technology Nodes
S. Singh, P. Muralidhar (GLOBALFOUNDRIES, Inc.), K. Das (GLOBALFOUNDRIES), and S. Scott (GLOBALFOUNDRIES)
 
1041
Post CMP Cleaning:  a Comparison of Contact and Non-Contact Physical Cleaning Methods (Cancelled)
 
1042
Effect of Pre-Wet Cleaning Conditions on the Pad Oxide Thickness (Cancelled)
1043
Real-Time pH Monitoring of Ultra-Diluted Chemistry with a Micro-Sampling pH Monitor
Y. Nakai, K. Miyamura, S. Takagi (HORIBA, Ltd.), and Y. Mori (HORIBA, Ltd.)
1044
Enhanced Point of Use Filtration for Cleaning without Small Particle Addition
S. J. Kweskin, P. Chen (SunEdison Semiconductor, Inc.), S. Ham (SunEdison Semiconductor, Inc.), T. Phely-Bobin (Entegris, Inc.), and A. Patel (Entegris, Inc.)
See more of: G02: Semiconductor Cleaning Science and Technology 14 (SCST 14)
See more of: Electronic Materials and Processing
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