Via and Trench Filling - Damascene Process and PCB

Monday, October 12, 2015: 10:40-12:00
Borein A (Hyatt Regency)
Chairs:
Kazuo Kondo and Masanori Hayase
10:40
863
Kinetic on Copper Damascene and Cuprous Concentration Computation in with Cl- and SPS
V. H. Hoang (Osaka Prefecture University) and K. Kondo (Osaka Prefecture University)
11:00
864
Microvia Filling in an Acidic Copper Planting Bath with Insoluble Anodes
C. C. Liu (National Chung Hsing University) and W. P. Dow (National Chung Hsing University)
11:20
865
Using Copolymers As Suppressors in a Copper Plating Bath for through-Hole Filling
S. I. Wen (National Chung Hsing University) and W. P. Dow (National Chung Hsing University)
11:40
866
Accelerating Effect of Additives in Damascene Electrodeposition
T. Kitahara (Kyoto University) and Y. Kaneko (Kyoto University)