Industrial Opportunities and Challenges in Electrochemical Engineering

Monday, October 12, 2015: 09:00-12:00
Remington A (Hyatt Regency)
Chairs:
Mark E. Orazem , Douglas P. Riemer and Gerardine G Botte
09:00
950
Advancements in Copper Interconnect Technology:  The Effect of Sulfuric Acid on the Adsorption & Desorption of an Advanced MLI Suppressor
W. Olson, M. Schmidt (University of Portland), A. Wetterer (University of Portland), and M. Willey (Moses Lake Industries Inc.)
09:20
951
Collaborative Development of a Functional Trivalent Chromium Electroplating Process
M. E. Inman (Faraday Technology Inc.), E. J. Taylor, T. D. Hall, S. Snyder (Faraday Technology, Inc.), and S. Lucatero (Faraday Technology, Inc.)
09:40
Break
10:00
952
Transition from Surface Finishing of Stainless Steel Semiconductor Valves to Nickel-Titanium Medical Materials By Analysis of Analogous Patent Art
E. J. Taylor (Faraday Technology, Inc.) and M. E. Inman (Faraday Technology Inc.)
10:20
953
Coupling Phenomena Between Micromorphological Evolution and Ionic Mass Transfer Rate during Ag Electrodeposition in AgNO3 Aqueous Solution
Y. Fukunaka (Nanotechnology Research Institute, Waseda University), T. Wakatsuki (Sept. Energy Sci. & Tech., Kyoto University), and T. Homma (Dept. of Applied Chemistry, Waseda University)
10:40
954
Fabrication of Bumping Mask for Flip-Chip Process on Stainless Steel Using through Mask Electrochemical Micro Machining(TMEMM)
J. B. Ahn, H. Y. Ryu (Hanyang University), and J. G. Park (Hanyang University)
11:00
955
Characterization of Electric Field Induced Ion Migration in Semiconductor Encapsulation Materials
S. Schwab (Kompetenzzentrum für Automobil u Industrieelektronik, Technical University of Vienna), J. Jung (Technical University of Vienna), S. Gruber (Infineon Technologies Austria AG, Technical University of Vienna), M. Bauer (Infineon Technologies AG Germany), M. Nelhiebel (Infineon Technologies Austria AG), and H. Hutter (Vienna University of Technology)
11:20
956
Preparation of Transparent-Type Plasmonic Sensors By the Sol-Gel Process and Electrodeposition
M. Saito (Res. Org. for Nano&Life Innovation, Waseda University), M. Mita (KYODO INTERNATIONAL INC.), M. Yanagisawa (Res. Org. for Nano & Life Innovation, Waseda University), and T. Homma (Res. Org. for Nano&Life Innovation, Waseda University, Dept. of Applied Chemistry, Waseda University)
11:40
957
A New Challeng for Hydrogen Isotope Electrolytic Separation System Combined with Fuel Cell
H. Matsushima, S. Shibuya, R. Ogawa (Hokkaido University), and M. Ueda (Hokkaido University)
See more of: F01: Electrochemical Engineering General Session
See more of: Electrochemical Engineering
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