Semiconductor Functionalization

Thursday, October 15, 2015: 14:00-16:20
103-A (Phoenix Convention Center)
Chair:
Jan Fransaer
14:00
942
(Invited) Electrochemical Processing of Metal-Insulator-Semiconductor (MIS) Photoelectrodes
D. Esposito (Columbia University) and N. Y. Labrador (Columbia University)
14:40
943
Hydrogen Atom Desorption Induced by Electron Bombardment on Si Surface
W. Li, S. Sato, H. Akima (Tohoku University), and M. Sakuraba (Tohoku University)
15:00
944
Electrochemical Doping As an Alternative to Ion Implantation in Oxide Semiconductor Thin Films
T. Yajima (JST-CREST, The University of Tokyo), G. Oike, T. Nishimura (The University of Tokyo), and A. Toriumi (The University of Tokyo)
15:20
945
Formation of Si Nanowires by Electro-reduction of Porous Ni/SiO2 Blocks in Molten CaCl2
S. Fang (General Research Institute for Non Ferrous Metals), H. Wang, J. Yang (General Research Institute for Nonferrous Metals,), B. Yu (General Research Institute for Non Ferrous Metals), and S. Lu (General Research Institute for Non Ferrous Metals)
15:40
946
The Device-Perimeter Dependency in the Transient Current of a Metal-Insulator-Metal-Insulator-Semiconductor Capacitor with Anodic Oxide Films
C. S. Liao (National Taiwan University) and J. G. Hwu (National Taiwan University)
16:00
Break
See more of: E04: Semiconductors, Metal Oxides, and Composites: Metallization and Electrodeposition of Thin Films and Nanostructures 3
See more of: Electrochemical/Electroless Deposition
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