In this work, we have investigated TiN/HfZrO/Al2O3/Ge gate stack using MOS capacitors with six different Zr/(Hf+Zr) content (0%, 25%, 33%, 50%, 75%, and 100%) in the dielectrics. The dielectrics were subjected to SPA plasma oxidation after the deposition process. Electrical characterization of these devices was studied in order to observe the impact of Zr addition in HfO2. The equivalent oxide thickness (EOT), flat-band voltage (VFB), interface state density (Dit), C-V hysteresis, and leakage current (I-V) behavior were analyzed. Figure 1 shows the comparison of EOT and VFB as a function of Zr content in the dielectrics. Figure 2 presents the C-V hysteresis data (to the left axis) and mid gap Dit (to the right axis) for these devices. The addition of Zr in HfO2 was found to enhance the EOT up to 75% Zr incorporation. These devices also showed lower hysteresis in the C-V characteristics. However, A reduction in EOT for these devices showed to increase the flat-band voltage shift (Fig. 1). While devices with 100% Zr showed the highest EOT value coupled with the lowest mid gap Dit, a reduction in EOT with Zr addition in HfO2 moderately increases the Dit (Fig. 2 to the right scale).
Figure Captions:
Fig. 1: Equivalent oxide thickness (filled squares to the right scale) and flat-band voltage (open triangles to the left scale) comparison for the addition of Zr in HfO2.
Fig. 2: Hysteresis behavior extracted from C-V sweep first from accumulation to inversion and then from inversion to accumulation (filled squares to the left scale) and interface state density by conductance method (open circles to the right scale) for ALD Hf1-xZrxO2/Al2O3 gate stacks on Ge substrate.
References:
1. Y. Ding, D. Misra, M. N. Bhuyian, ECS Trans., 69 (5) 313-322 (2015).
2. J. Lin, Y. Y. Gomeniuk, S. Monaghan et al., J. Appl. Phys., 114, 144105 (2013).
3. M. N. Bhuyian, D. Misra, K. Tapily et al., ECS. J. of Solid State Sci. Tech., 3(5) N83 (2014).