SiC Material and Devices 1

Monday, 29 May 2017: 14:00-15:20
Cambridge (Hilton New Orleans Riverside)
Chairs:
Soohwan Jang and Scott Calabrese Barton
14:30
Effect of Boro-Silicate Glass (BSG) Gate Dielectric with Antimony Surface Doping on Channel Transport of 4H-SiC Mosfets
Y. Zheng, T. Isaacs-smith, A. Ahyi (Auburn University), P. Mooney (Simon Fraser University), and S. Dhar (Auburn University)
14:50
Effect of Reactive Ion Etch on 4H-SiC Mos Capacitor Performances
A. Jayawardena, A. Ahyi, T. Isaacs-smith, and S. Dhar (Auburn University)
15:10
Break