Semiconductor-Solution Interfaces 2

Wednesday, 31 May 2017: 08:30-09:30
Churchill C2 (Hilton New Orleans Riverside)
Chair:
Arnaud Etcheberry
08:30
Study of the Silicon Electrochemical Response Depending on the Electroless Nickel Bath Composition
E. Delbos, H. El Belghiti (Institut Lavoisier de Versailles, KMG Ultra Pure Chemicals), D. Aureau, M. Frégnaux, M. Bouttemy, and A. Etcheberry (Institut Lavoisier de Versailles)
08:50
Electrochemical Deposition of Tin Selenide (SnSex) Thin Films
P. Howell and J. L. Stickney (University of Georgia)
09:10
Process of Formation of Porous Layers in n-InP
N. Quill, I. Clancy (Department of Physics, University of Limerick), S. Nakahara (Department of Physics, University of Limerick, Bernal Institute, University of Limerick.), S. Belochapkine (Bernal Institute, University of Limerick), C. O'Dwyer (Department of Chemistry, University College Cork), D. N. Buckley (Department of Physics, University of Limerick, Dept. of Chem. Eng., Case Western Reserve University), and R. P. Lynch (Department of Physics, University of Limerick, Bernal Institute, University of Limerick, Ireland)