Description of the unique system designed and built at NRL for these type of studies will be presented.3 It combines a surface science UHV chamber; with X-ray photoelectron and Auger electron spectroscopies (XPS & AES), transmission or reflection-absorption thin-film FTIR spectroscopy, low-energy electron diffraction (LEED), reflection electron energy loss spectroscopy (REELS), and surface preparation, with a chamber-within-a-chamber design for performing ALD and ALEt at pressures from mTorr to Torr. Without exposure to ambient, the ALD system is pumped out and opened to the UHV environment for spectroscopy. A quantified, micro-dosing gas reagent delivery system is also implemented, so quantitative ALD reactant exposure may be correlated with actual surface reactions.4 Spectroscopic results and surface reconstruction patterns for GaSb interfaces acquired in above system will be presented.
1L.B. Ruppalt et al., Appl. Phys. Lett. 101, 231601 (2012).
2V.M. Bermudez, J. Appl. Phys. 114, 024903 (2013).
3V.M. Bermudez, Rev. Sci. Instrum. 85, 114101 (2014).
4T.J. Larrabee, T.E. Mallouk, D.L. Allara, Rev. Sci. Instrum. 84, 014102 (2013).