(Invited) Industry Perspectives on Atomic Layer Etching

Monday, 2 October 2017: 08:40
Chesapeake L (Gaylord National Resort and Convention Center)
K. J. Kanarik (Lam Research)
This presentation will describe the industry perspectives on atomic layer etching (ALE), a technique that is rapidly growing as an enabling technique with atomic scale fidelity in the fabrication of modern nanometer-sized electronics with features at 10 nm and below (1).
  1. K.J. Kanarik, T. Lill, E. Hudson, S. Tan, S. Sriraman, J. Marks, V. Vahedi, R.A. Gottscho; J. Vac. Sci. Technol. A 33, 020802 (2015).