E01 Poster Session

Tuesday, 3 October 2017: 18:00-20:00
Prince George's Exhibit Hall D/E (Gaylord National Resort and Convention Center)
916
Oxygen Reduction Reaction As the Essential Process for Cathodic Electrodeposition of Metal Oxide Thin Films
H. Sun (Yamagata University), J. Zhang (Tianjin Normal University), L. Sun, A. Masuhara (Yamagata University), M. S. White (University of Vermont), A. Khosla, and T. Yoshida (Yamagata University)
917
Development of Environmentally Conscious Electrodeposition Process "Solid Electrodeposition (SED)"
H. Yanagimoto, M. Hiraoka, Y. Sato, H. Iisaka, J. Murai (Toyota Motor Corporation), M. Itagaki (Tokyo University of Science), and K. Akamatsu (FIRST, Konan University)
918
Morphology and Composition of Cu2S Ultra-Thin Films Deposited by E-ALD
F. Russo, A. Giaccherini, E. Salvietti (Department of chemistry - University of Florence), E. Berretti (Department of Chemistry - University of Florence), M. Passaponti (Department of chemistry - University of Florence), A. Lavacchi (CNR-ICCOM), G. Montegrossi (CNR-IGG), E. Piciollo (LEM S.r.l.), F. Di Benedetto (Department of earth sciences - University of Florence), and M. Innocenti (CNR-ICCOM, Department of Chemistry - University of Florence)
919
Color Measurements in Electroplating Industry: Implications for Product Quality Control
W. Giurlani (Department of Chemistry - University of Florence), F. Gambinossi, E. Salvietti (Department of Chemistry, University of Florence.), M. Passaponti (Università di Firenze, Dipartimento di Chimica.), and M. Innocenti (CNR-ICCOM)
920
Mass Transfer Mechanisms in Solid Electro Deposition
Y. Narui, Y. Hoshi, I. Shitanda, M. Itagaki (Tokyo University of Science), H. Yanagimoto, M. Hiraoka, and H. Iisaka (Toyota Motor Corporation)
921
Electrodeposition and Characterization of Thin Film of Black-Gold
E. Piciollo, C. Picchi (Lem srl Socio Unico), A. Ceccarini (Department of chemistry - University of Pisa.), E. Salvietti, A. De Luca (Department of chemistry - University of Florence), F. Di Benedetto (Department of earth sciences - University of Florence), S. Caporali (Department of engineering - University of Florence), and M. Innocenti (CNR-ICCOM)
922
Two-Dimensional Semiconductors Thin Films of MoS2 and MoSe2 on Ag(111)
E. Salvietti, M. Vizza, A. Giaccherini, M. Passaponti (Department of chemistry - University of Florence), E. Piciollo (Lem srl Socio Unico), F. Di Benedetto (Department of earth sciences - University of Florence), M. Cavallini (CNR, Istituto per lo studio dei materiali nanostutturati), and M. Innocenti (CNR-ICCOM)
923
In-Situ observation of Cu Electrodeposition and Dissolution Behavior By Video-AFM
T. Yoshioka, H. Matsushima, and M. Ueda (Hokkaido University)
924
Electrochemical Behavior of Silver Electrodeposition Using Gel Electrolyte
H. Sato, Y. Hoshi, I. Shitanda, M. Itagaki (Tokyo University of Science), and M. Tagaya (Yoshino Denka Kogyo, Inc.)
925
A Novel Electrochemical Method for Analysis of Thin Metal Films and Bilayers for Application in the PCB Industry
E. J. R. Palin, K. S. Ryder, A. R. Hillman (University of Leicester), E. L. Smith (Nottingham Trent University), V. Ferreira (University of Leicester, Universidade de Lisboa), R. Sapstead (University of Leicester), N. J. Steinke (STFC Rutherford Appleton Laboratory), R. Barker (University of Dundee, Institut Laue Langevin), and R. Dalgliesh (STFC Rutherford Appleton Laboratory)
 
926
Additional Approaches to Experimental Validation of the Phenomenon of Electrochemical Phase Formation in Metals Via a Supercooled Liquid State Stage (Cancelled)
927
Electrodeposition of Manganese Thin Films from Choline Chloride/Urea Based Ionic Liquids
W. D. Sides and Q. Huang (The University of Alabama)
See more of: E01: Fundamentals of Electrochemical Growth from UPD to Microstructures 4
See more of: Electrochemical/Electroless Deposition
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