(Invited) Challenges on Surface Conditioning in 3D Device Architectures: Triple-Gate FinFETs, Gate-All-Around Lateral and Vertical Nanowire FETs
A. Veloso, V. Paraschiv, E. Vecchio, K. Devriendt, W. Li, E. Simoen, B. T. Chan, Z. Tao (Imec), E. Rosseel (imec), R. Loo, A. P. Milenin, B. Kunert, L. Teugels, F. Sebaai, C. Lorant, D. H. van Dorp, E. Altamirano-Sánchez, S. Brus, P. Marien, C. Fleischmann, D. Melkonyan, T. Huynh-Bao, G. Eneman, G. Hellings, A. Sibaja-Hernandez, P. Matagne, N. Waldron, D. Mocuta, and N. Collaert (Imec)
