G01 15th International Symposium on Semiconductor Cleaning Science and Technology (SCST 15)

Lead Organizer: Takeshi Hattori (Hattori Consulting International)

Co-organizers: Jerzy Ruzyllo (School of EE and Comp. Sci., Penn State University) , Paul W Mertens (imec vzw) , Anthony J. Muscat (University of Arizona) , Richard E Novak (Novak Consulting) and Koichiro Saga (Sony Semiconductor Solutions Corporation)

Monday, 2 October 2017

08:50-09:00


Welcoming Remarks
Chesapeake I
Chair(s): Jerzy Ruzyllo and Takeshi Hattori

09:00-10:00


Keynote
Chesapeake I
Chair(s): Jerzy Ruzyllo and Takeshi Hattori

10:00-12:20


Pattern Collapse-related Issues and Their Solutions
Chesapeake I
Chair(s): Paul W Mertens and Stijn F. L. Mertens

14:00-16:00


Wet Cleaning and Contamination Control
Chesapeake I
Chair(s): Richard E Novak and Koichiro Saga

Tuesday, 3 October 2017

08:30-08:40


Introductory Remarks
Chesapeake I
Chair(s): Takeshi Hattori and Jerzy Ruzyllo

08:40-11:50


Ge, SiGe, and III-V Surface Conditioning and Etching
Chesapeake I
Chair(s): Anthony J. Muscat and Kenta Arima

14:00-15:40


Photoresist and Dry Etch Residue Removal
Chesapeake I
Chair(s): Koichiro Saga and Richard E Novak

15:40-17:20


Wet Etching and Contamination Removal
Chesapeake I
Chair(s): Paul W Mertens and Anthony J. Muscat