Wet Cleaning and Contamination Control

Monday, 2 October 2017: 14:00-16:00
Chesapeake I (Gaylord National Resort and Convention Center)
Chairs:
Richard E Novak and Koichiro Saga
14:00
1062
Study of Mass Transport for Efficient Fluid Processing
P. W. Mertens, M. Haslinger, M. Soha, and J. John (imec)
14:20
1063
Effect of VUV Lamp on Wafer Charging by Single-Wafer Wet Clean
K. I. Sano, R. Dylewicz (Lam Research Corp.), X. Man (Lam Research Corporation), D. Lou (Lam Research Corp.), J. Zhu (Lam Research Corporation), G. Harm (Lam Research Corp.), and M. N. Kawaguchi (Lam Research Corporation)
14:40
1064
Post Cleaning for FEOL CMP with Silica and Ceria Slurries
W. T. Tseng, A. Jha, D. Stoll (GLOBALFOUNDRIES), C. Wu (GLOBALFOUNDRIES Inc), T. McCormack (GLOBALFOUNDRIES), and J. C. Yang (Globalfoundries US)
15:00
1065
Deep Trenches Cleanliness Challenges for CMOS Image Sensors
P. Garnier, F. Dignat (STMicroelectronics), and C. De Buttet (CEA-LETI)
15:20
1066
Room Temperature Photoluminescence Characterization of Silicon Wafers for In-Line Monitoring Applications
W. S. Yoo, T. Ishigaki, and K. Kang (WaferMasters, Inc.)
15:40
1067
A Novel Cleaning Approach to Remove the Carbon Contaminant from Ru Surface of EUV Mask
M. S. Kim (Hanyang University), H. J. Song (Hanyang university), H. T. Kim, and J. G. Park (Hanyang University)
See more of: G01: 15th International Symposium on Semiconductor Cleaning Science and Technology (SCST 15)
See more of: Electronic Materials and Processing
<< Previous Session | Next Session >>