Area Selective ALD

Monday, 2 October 2017: 14:00-16:00
Chesapeake L (Gaylord National Resort and Convention Center)
Chair:
Stefan De Gendt
14:00
1091
(Invited) Selective Atomic Layer Deposition of Cobalt for Back End of Line
T. D. M. Elko-Hansen and J. G. Ekerdt (University of Texas at Austin)
14:40
1092
(Invited) Area-Selective Atomic Layer Deposition: Role of Surface Chemistry
A. Mameli, B. Karasulu (Eindhoven University of Technology), M. A. Verheijen (Philips Innovation Services), A. J. M. Mackus, W. M. M. Kessels, and F. Roozeboom (Eindhoven University of Technology)
15:20
1093
(Invited) Photo-Assisted ALD: Process Development and Application Perspectives
V. Miikkulainen, K. Väyrynen (University of Helsinki), V. Kilpi (Picosun Oy), Z. Han, M. Vehkamäki, K. Mizohata, J. Räisänen, and M. Ritala (University of Helsinki)
See more of: G02: Atomic Layer Deposition Applications 13
See more of: Electronic Materials and Processing
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