High-k - Perspectives

Monday, 2 October 2017: 08:30-11:00
Chesapeake D (Gaylord National Resort and Convention Center)
Chairs:
Durgamadhab Misra and Stefan De Gendt
08:30
Welcoming Remarks
08:40
814
(Invited) Past, Present, and Future of High-k/Metal Gate Technologies
H. Iwai (Tokyo Institute of Technology, National Chiao Tung University)
09:10
815
(Invited) Amorphous Zr-Doped HfO2 high-K Dielectric Thin Film for Electronic and Optoelectronic Applications
Y. Kuo (Texas A&M University)
09:40
Break
10:00
816
(Invited) High-K Dielectrics: A Perspective on Applications from Silicon to 2D Materials
R. M. Wallace (University of Texas at Dallas)
10:30
817
(Invited) High-k, Higher-k and Ferroelectric HfO2
A. Toriumi (The University of Tokyo)
See more of: D01: Semiconductors, Dielectrics, and Metals for Nanoelectronics 15: In Memory of Samares Kar
See more of: Dielectric Science and Materials
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