Lately, Non-volatile resistance switching (NVRS) phenomenon was first observed in a variety of monolayer semiconducting TMDs sandwiched between metal electrodes. NVRS represents the resistance modulation between a high-resistance state (HRS, ROFF) and a low-resistance state (LRS, RON) and then preserve the state without power consumption. Especially, these memristor effects in atomically thin nanomaterials or atomic sheets are labeled as atomristor. Although other solution-processed multilayer two-dimensional (2D) materials have shown NVRS effect, it was believed that monolayer materials can't have an NVRS effect due to its leakage current. However, Sangwan et al. discovered NVRS effects in monolayer MoS2 lateral device using the resistance modulation of its grain boundaries. Nevertheless, for the practical applications, vertical MIM structure is advantageous for smaller device dimension and denser integration. Toward this end, here, we report zero-static power non-volatile RF switches based on MoS2 atomristor. RF circuits for wide-band system require an RF switch having low ON-state resistance and low OFF-state capacitance to achieve a high figure of merits (FOM) cutoff frequency (fc=1/2πRONCOFF). Our MoS2 RF switch can be programmed with a voltage as low as 0.7 V and has an ON/OFF conductance ratio up to 104. Interestingly, we found that our devices show the one-dimensional area-invariant RON (<10 Ω), and two-dimensional area-dependent COFF, (~20 fF/μm2), yields a higher fc by reducing device area, a defining advantage over PCM switches. We demonstrate the RF performance of the device up to 50 GHz and report 0.3 dB insertion loss, 20 dB isolation (both at 50 GHz), 10 THz cutoff frequency and power-handling capability. Although various RF switches based on MEMS and PC materials have been broadly reported, our non-volatile low-power RF switches based on MoS2 atomristor present a better solution in respect to the described RF performance, non-volatility, and area-dependency.