Our recent studies have focused on the epitaxial growth of WSe2 and (Mo,W)S2 monolayer films, alloys and heterostructures using metal hexacarbonyl and hydride chalcogen precursors on substrates including sapphire and hexagonal boron nitride (hBN). A multi-step precursor modulation growth method was developed to independently control nucleation density and the lateral growth rate of TMD domains on the substrate. This approach also enables an estimation of metal-species surface diffusivity and domain growth rate as a function of growth conditions providing insight into the fundamental mechanisms of monolayer growth. Using the multi-step growth process, coalesced monolayer and few-layer TMD films were obtained on sapphire substrates up to 2” in diameter at growth rates on the order of ~ 1 monolayer/hour. In-plane X-ray diffraction demonstrates that the films are epitaxially oriented with respect to the sapphire resulting from a merging of 0o and 60o oriented domains. Room temperature photoluminescence (PL) measurements demonstrate strong emission peaks in the range of ~1.6 eV for WSe2 and ~2.0 eV for WS2 monolayers with lateral variations that may arise from residual strain in the films. (Mo,W)S2 alloy growth using simultaneous flows of Mo and W hexacarbonyl precursors reveals evidence of atomic scale ordering of Mo and W atoms within the monolayer. Growth and characterization of MoS2/WS2 and WSe2/WS2 vertical heterostructures will also be discussed.