Plasma Nanoscience and Nanotechnology 3

Wednesday, 3 October 2018: 09:00-11:20
Universal 15 (Expo Center)
Chairs:
Dennis W. Hess and Oana Leonte
09:20
(Invited) Fine Temperature Monitoring of Si Wafer for Plasma Processing
M. Ito (Meijo University), T. Tsutsumi (Nagoya University), T. Ohta (Meijo University), and M. Hori (Nagoya University)
10:00
10:20
(Invited) Patterning of Embedded STT-MRAM Devices: Challenges and Solutions
I. Berry (Lam Research), J. Park, J. Kim (Samsung Electronics), B. Min, T. Lill, and V. Vahedi (Lam Research)
12:00
Plasma Deposited Metal-Oxide Nanosensors for Amine Detection
G. Filipič (Jozef Stefan Institute), J. Gruenwald (Gruenwald Laboratories GmbH), H. Puliyalil (Jozef Stefan Institute, Jamova 39, Ljubljana, Slovenia, IMEC), J. Zavašnik (Jozef Stefan Institute, Jamova 39, Ljubljana, Slovenia, Max-Planck-Institut für Eisenforschung, Germany), and U. Cvelbar (Jozef Stefan Institute)