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Investigation of Embedded SiGe Source/Drain for 28nm HKMG PFET Performance Enhancement

Monday, May 13, 2013: 10:40
Norfolk, Mezzanine Level (Sheraton)
El Mehdi Bazizi , GLOBALFOUNDRIES, Dresden, Germany
Alban Zaka , GLOBALFOUNDRIES
Gabriela Dilliway , GLOBALFOUNDRIES
Bo Bai , GLOBALFOUNDRIES
Maciej Wiatr , GLOBALFOUNDRIES
Francis Benistant , GLOBALFOUNDRIES
Manfred Horstmann , GLOBALFOUNDRIES

Abstract:

  • E5-0850 (128.3KB) - Abstract Text
See more of: Planar Si &SiGe: Stressors/Gate Stack
See more of: E5: Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 3
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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