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Interface Trap Redistribution and Deep Depletion Behavior of Non-Planar MOS with Ultra Thin Oxide Grown by Anodic Oxidation

Wednesday, May 15, 2013
Osgoode Ballroom, Lower Concourse Level (Sheraton)
Po-Hao Tseng, National Taiwan University , National Taiwan University, Taipei, Taiwan
Jenn-Gwo Hwu , National Taiwan University, Taipei, Taiwan

Abstract:

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