E2 - Poster Session

Wednesday, May 15, 2013: 18:00-20:00
Osgoode Ballroom, Lower Concourse Level (Sheraton)
Chairs:
Durga Misra, Ph.D. , Yaw S. Obeng and Zia Karim
770
Application of an Extended Unified Schottky-Poole-Frenkel Model to High-k Capacitor Structures Used in Analog Integrated Circuit Technology
Wai Shing Lau, PhD, Zhejiang University
771
Charateristics of Low Temperature High Quality Silicon Oxide by Plasma Enhanced Atomic Layer Deposition with In Situ Plasma Densification Process
Haiwon Kim, Research and Development group, Eugene Technology; Sergey N. Zaretskiy, Research and Development group, Eugene Technology; Seungwoo Shin, Research and Development group, Eugene Technology; Wooduck Jung, Research and Development group, Eugene Technology; Ryong Hwang, Research and Development group, Eugene Technology; Choonsik Jeong, Research and Development group, Eugene Technology; Seongjin Park, Research and Development group, Eugene Technology; Hanna Hwang, Research and Development group, Eugene Technology; Ilsub Chung, College of Information and Communication Engineering, Sungkyunkwan University
772
Interface Trap Redistribution and Deep Depletion Behavior of Non-Planar MOS with Ultra Thin Oxide Grown by Anodic Oxidation
Po-Hao Tseng, National Taiwan University, National Taiwan University; Jenn-Gwo Hwu, National Taiwan University
773
Effect of Composition Rate on Erbium Silicide Work Function on Different Silicon Surface Orientation
Hiroaki Tanaka, Ph. D, Tohoku University; Akinobu Teramoto, Tohoku University; Tsukasa Motoya, Mitsubisi Electric Corporation; Shigetoshi Sugawa, Tohoku University; Tadahiro Ohmi, Tohoku University
774
Effect of Moisture on Electrical and Reliability Characteristics for Dense and Porous Low-k Dielectrics
Yi-Lung Cheng, PH.D, National Chi-Nan University; Jun-Fu Huang, Master, National Chi-Nan University; Wei-Yuan Chang, Master, Department of Materials Science and Engineering, National Chiao-Tung University; Yu-Min Chang, PH.D, Department of Materials Science and Engineering, National Chiao-Tung University; Jihperng (Jim) Leu, National Chiao Tung University
775
Experimental Observation of Poole-Frenkel Saturation in an Ultrathin Tantalum Oxide Capacitor Structure
Wai Shing Lau, PhD, Zhejiang University
776
Sampling and Analysis of Boron Tribromide for Trace Metal Contaminants
Phillip L Clancy, PhD, Air Liquide Balazs Analytical Services; Dan Cowles, PhD, Air liquide Balazs Analytical Services; Piyamit Chitrathorn, BS, Air Liquide Balazs Analytical Services; Hugh E. Gotts, PhD, Air Liquide Balazs Analytical Services
777
Self- Rectification Resistance Switching Memory Device with Bipolar Operation Mode
Geng-Wei Chang, National Chiao Tung University; Ting-Chang Chang, National Sun Yat-Sen University; Yong-En Syu, Taiwan Semiconductor Manufacturing Company, Hsinchu, Taiwan; Kuan-Chang Chang, National Sun Yat-Sen University; Tsung-Ming Tsai, National Sun Yat-Sen University; Ya-Hsiang Tai, National Chiao Tung University
778
Improved Characteristics of GaSb MOS Capacitors by Ozone Post Deposition Treatment
Lianfeng Zhao, Tsinghua National Laboratory for Information Science and Technology; Zhen Tan, Tsinghua National Laboratory for Information Science and Technology; Jing Wang, Tsinghua National Laboratory for Information Science and Technology; Jun Xu, Tsinghua National Laboratory for Information Science and Technology
See more of: E2: Graphene, Ge/III-V, and Emerging Materials for Post CMOS Applications 5
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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