859
(Invited) Strain-Enhanced Performance of Si-Nanowire FETs
(Invited) Strain-Enhanced Performance of Si-Nanowire FETs
Tuesday, May 14, 2013: 08:00
Norfolk, Mezzanine Level (Sheraton)
Mikaël Cassé
,
17, Rue Des Martyrs, CEA LETI, Grenoble, France
Sylvain Barraud
,
CEA LETI
Rémi Coquand
,
CEA-Leti
Masahiro Koyama
,
CEA LETI
David Cooper
,
CEA LETI
C. Vizioz
,
CEA-Leti
C. Comboroure
,
CEA-Leti
P. Perreau
,
CEA-Leti
V. Maffini-Alvaro
,
CEA-Leti
C. Tabone
,
CEA-Leti
L. Tosti
,
CEA-Leti
S. Barnola
,
CEA-Leti
Vincent Delaye
,
CEA-Leti
Francois Aussenac
,
CEA France
Gérard Ghibaudo
,
IMEP-LAHC
Hiroshi Iwai
,
Tokyo Institute of Technology
Gilles Reimbold
,
CEA LETI
Abstract:
- E5-0859 (123.2KB) - Abstract Text
See more of: Non-Planar Devices: FINFETS/Nanowires
See more of: E5: Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 3
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
See more of: E5: Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 3
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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