2097
Evaluation of An Effective Wet Cleaning Method for Particle Removal on Various Thin Films

Monday, October 28, 2013: 11:00
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Yoon-Sik Cho , Hanyang University
Hun-Hee Lee , Hanyang University, Ansan, South Korea
Min-Sang Yun , Memory Cleaning/CMP Technology Team, Memory Division, Semiconductor Business, Samsung Electronics Co., LTD.,
Hasub Hwang , Memory Cleaning/CMP Technology Team, Memory Division, Semiconductor Business, Samsung Electronics Co., LTD.,
Min-Su Kim , Hanyang University
Bong-Kyun Kang , Hanyang University
Ahmed A. Busnaina , Northeastern University
Jin-Goo Park , Hanyang University, Ansan, South Korea

Abstract:

See more of: Particle Removal
See more of: E8: Semiconductor Cleaning Science and Technology 13 (SCST 13)
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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