2098
Surface Cleaning Using CO2 Gas Cluster for Semiconductor Device

Monday, October 28, 2013: 11:20
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Yujin Cho , Department of Mechanical Engineering, SungKyunKwan University, Suwon, South Korea
Hoomi Choi, Doctor , Samsung electronics
Taesung Kim, Doctor , Sungkyunkwan University, Suwon, South Korea

Abstract:

  • E8-2098 (409.9KB) - Abstract Text
See more of: Particle Removal
See more of: E8: Semiconductor Cleaning Science and Technology 13 (SCST 13)
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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