2102
A Study on the Removal Method of Si Residue during Si Wet Etching
Monday, October 28, 2013: 14:40
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Kihyung Ko
,
Samsung Electronics Co. ; Sungkunkwan University, Hwasung, South Korea
Hayoung Jeon
,
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co
Myunggeun Song
,
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co
Jeongnam Han
,
Samsung Electronics Co.
Boun Yoon
,
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co
Siyoung Choi, Ph.D
,
SAMSUNG ELECTRONICS Co., Ltd.
Hokyu Kang
,
Samsung Electronics Co.
Chilgi Lee, Doctor
,
School of Information and Communication Engineering, Sungkyunkwan University
Taesung Kim, Doctor
,
Sungkyunkwan University, Suwon, South Korea
