2129
(Invited) A Novel Approach to Clean Surface for High Mobility Channel Materials with In Situ Atomic Hydrogen Clean

Wednesday, October 30, 2013: 08:20
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Jeongwon Park , Applied Materials, Palo Alto, CA
Joe Griffith Cruz , Applied Materials
Bo Zheng, PhD , Applied Materials
Jerry Gelatos, PhD , Applied Materials
Murali Narasimhan , Applied Materials
Pravin K Narwankar, PhD , Applied Materials

Abstract:

  • E8-2129 (228.2KB) - Abstract Text
See more of: Non-silicon Material Cleaning and Conditioning
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