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Basal Plane Dislocation Mitigation Using High Temperature Annealing in 4H-SiC Epitaxy
Basal Plane Dislocation Mitigation Using High Temperature Annealing in 4H-SiC Epitaxy
Wednesday, October 30, 2013: 11:50
Continental 9, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Abstract:
- E3-1939 (1355.6KB) - Abstract Text