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Source and Drain Contact Module for FDSOI MOSFETs : Silicidation and Strain Engineering

Tuesday, October 29, 2013: 16:30
Continental 7, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Veronique Carron , CEA, LETI, Grenoble, France
Fabrice Nemouchi , CEA, LETI
Jean-Michel Hartmann , CEA, LETI
David Cooper , CEA, LETI
Jean-Francois Damlencourt , CEA, LETI
Sophie Bernasconi , CEA, LETI
Sylvie Favier , STMicroelectronics
Yves Morand , STMicroelectronics

Abstract:

See more of: Front-end Processing
See more of: E12: ULSI Process Integration 8
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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