Atomic Layer Etching I

Thursday, October 15, 2015: 08:00-10:00
Phoenix East (Hyatt Regency)
Fred Roozeboom and Thorsten Lill
(Invited) An Industry Perspective on Atomic Layer Etching
S. Suri, C. T. Carver, R. Turkot Jr., P. E. Romero, T. A. Tronic (Intel Corporation), and J. Plombon (Intel Corporation)
Selective Removal of Native SiO2 Using XeF2
A. Hinckley (University of Arizona), P. Mancheno-Posso, C. S. Lai (LAM Research), and A. J. Muscat (University of Arizona)
(Invited) Atomic Layer Etching Using Thermal Reactions: Atomic Layer Deposition in Reverse
Y. Lee, J. W. DuMont (University of Colorado), and S. M. George (University of Colorado)