Atomic Layer Etching I

Thursday, October 15, 2015: 08:00-10:00
Phoenix East (Hyatt Regency)
Chairs:
Fred Roozeboom and Thorsten Lill
08:00
(Invited) An Industry Perspective on Atomic Layer Etching
S. Suri, C. T. Carver, R. Turkot Jr., P. E. Romero, T. A. Tronic (Intel Corporation), and J. Plombon (Intel Corporation)
08:40
Selective Removal of Native SiO2 Using XeF2
A. Hinckley (University of Arizona), P. Mancheno-Posso, C. S. Lai (LAM Research), and A. J. Muscat (University of Arizona)
09:00
(Invited) Atomic Layer Etching Using Thermal Reactions: Atomic Layer Deposition in Reverse
Y. Lee, J. W. DuMont (University of Colorado), and S. M. George (University of Colorado)