Atomic Layer Etching II

Thursday, October 15, 2015: 10:00-11:40
Phoenix East (Hyatt Regency)
Craig Huffman and Steven M. George
A Spatial ALD Oxide Passivation Module in an All-Spatial Etch-Passivation Cluster Concept
F. Roozeboom (Eindhoven University of Technology, TNO Eindhoven), F. van den Bruele (TNO Eindhoven), Y. Creyghton (TNO Eindhoven), P. Poodt (TNO/Solliance), and W. M. M. Kessels (Eindhoven University of Technology)
(Invited) Divide Et Impera: Towards New Frontiers with Atomic Layer Etching
T. Lill (Lam Research), K. J. Kanarik, S. S. H. Tan (Lam Research Corporation), M. Shen (Lam Research), Y. Pan, J. Marks (Lam Research Corporation), V. Vahedi (Lam Research), and R. A. Gottscho (Lam Research)