The electrodeposition of semiconductors is a living field of electrodeposition technologies since many years, which remains highly challenging both at the fundamental level and at the application level. Well known examples are related to the electrodeposition of cadmium telluride thin films, or copper indium diselenide which went from fundamental studies to industrial applications in the field of photovoltaics. Semiconducting oxides like ZnO, copper oxides are other examples of successful developements. New routes are explored today for the electrodeposition of crystalline silicon thin films. Electrodeposition thus remains as a potential alternative or supplement to classical vapor phase or metallurgical routes for next generation technologies, as in photovoltaics, where low cost and large area processing capabilities are still required. In this presentation we will present the state of the art of the electrodeposition of semiconductors, both on the basis of a literature survey and also from direct studies carried out in our laboratory and research environment. We will focus on the design of electrodeposition conditions and concepts allowing, in the on going studies, to deposit either directly or indirectly semiconductor materials. Direct deposition allows the direct formation of the material while indirect formation involves the deposition of precursor materials (like metallic layers) followed by reactive post treatments. A special attention will be given to the deposition of semiconductors on semiconductors (including photodeposition) and to emerging field of the deposition on localised areas, like for microcells areas in new photovoltaics devices.