(Invited) Nanofabrication of Devices Using Scanning Force Microscopes

Tuesday, 3 October 2017: 15:50
Chesapeake C (Gaylord National Resort and Convention Center)
V. Bouchiat (CNRS, Grenoble-Alpes Université)
Among the most promising nanometer-scale manufacturing methods are lithographies using scanning probe microscopes mainly because they operate in the near field, contrary to all the competing techniques that operate by emitting radiation (light, electrons) in a far-field regime.  The local probe microscopes encompasses a large family, the best known of which are the tunneling microscope (STM) and the atomic force microscope (AFM). They are based on a very local interaction between a tip and a given substrate. The scanning of the tip is carried out by piezoelectric ceramics whose movement is controlled to a fraction of angstrom. The measurement of the signal given by the tip/sample interation gives a topographical image of the surface, which can reach atomic resolution. The principles of these nanolithography techniques derived from these microscopes are based on a simple observation: since these techniques make it possible to carry out topographic imaging of a surface on a nanometric or even atomic scale, why not use them to modify surfaces at this same scale?

I will make a review of recent advances in the field of nanofabrication of fully operational quantum devices using Scanning Probe microscopes. In particular I will detail the techniques involving anodization techniques under the voltage biased tip of an Atomic Force Microscope and will conclude on the perspectives of using these techniques for large throuput at the industrial scale.