Novel Process-Patterning

Tuesday, 3 October 2017: 15:50-17:20
Chesapeake C (Gaylord National Resort and Convention Center)
Chairs:
Seiichi Miyazaki and Vincent Bouchiat
15:50
(Invited) Nanofabrication of Devices Using Scanning Force Microscopes
V. Bouchiat (CNRS, Grenoble-Alpes Université)
16:20
Etching Methods for STT-MRAM
E. J. O'Sullivan (IBM Research Division, T.J. Watson Research Center), A. J. Annunziata (IBM Research Div., T.J. Watson Res. Center), J. Gonsalves (IBM Research Division, T.J. Watson Research Center), G. Hu (IBM Research Division, T.J. Watson Res. Center), E. A. Joseph (IBM Research Division, T.J. Watson Research Center), R. Kothandaraman, G. Lauer (IBM Research Division, T. J. Watson Research Center), N. Marchack (IBM Research Division, T.J. Watson Research Center), J. J. Nowak (IBM Research Division, T. J. Watson Research Center), R. P. Robertazzi (IBM T.J. Watson Research Center), J. Z. Sun (IBM Research Division, T. J. Watson Research Center), T. Suwannasiri (IBM Research Division, T. J. Watson Research Center,), P. L. Trouilloud (IBM Research Division, T.J. Watson Research Center), Y. Zhu, and D. C. Worledge (IBM Research Division, T. J. Watson Research Center)
16:40
Via Bottom Profile Optimization in All-in-One Etch with Double Patterning Scheme
K. F. Yuan, J. Q. Zhou, M. D. Hu (SMIC), Q. Y. He (SMIC, China), and H. Y. Zhang (Semiconductor Manufacturing International Corporation)
17:00
The Improvement of the Pattern Wiggling Profile by Photo Resist Treatment
P. P. Liu (Semiconductor Manufacturing International Corporation), C. L. Zhang, and H. Y. Zhang (Semiconductor Manufacturing International Corp.)