Novel Process-Growth 1

Wednesday, 4 October 2017: 14:00-15:40
Chesapeake C (Gaylord National Resort and Convention Center)
Chairs:
Roger Loo and Andreas Mai
14:00
1150
(Invited) Epitaxial CVD Growth of Ultra-Thin Si Passivation Layers on Strained Ge Fin Structures
R. Loo, H. Arimura (Imec, Belgium), D. J. Cott, L. Witters, G. Pourtois (imec, Belgium), A. Schulze (imec), B. Douhard (Imec, Belgium), W. Vanherle, G. Eneman, O. Richard, P. Favia, J. Mitard, D. Mocuta (imec, Belgium), R. Langer, and N. Collaert (Imec)
14:30
1151
(Invited) Growth and Applications of Si1-xSnx Thin Films
M. Kurosawa (Nagoya University, JST-PRESTO), O. Nakatsuka, and S. Zaima (Nagoya University)
15:00
1152
(Invited) Functional Oxides for Energy Efficient Information Technology
C. Dubourdieu (Helmholtz Zentrum Berlin für Materialien und Energie)
15:30
Break
See more of: G03: Semiconductor Process Integration 10
See more of: Electronic Materials and Processing
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