2246
Low-Frequency-Noise-Based Oxide Trap Profiling in Replacement High-k/Metal-Gate pMOSFETs

Wednesday, October 30, 2013: 14:30
Continental 7, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Eddy Roger Simoen , Imec, Leuven, Belgium
Jae-Woo Lee, Dr. , Imec
Anabela Veloso , Imec, Leuven, Belgium
Vasile Paraschiv , Imec
Naoto Horiguchi , Imec
Cor Claeys , Imec

Abstract:

See more of: Device Characterization
See more of: E12: ULSI Process Integration 8
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
<< Previous Abstract | Next Abstract >>