New Materials and Processes I

Wednesday, October 14, 2015: 09:00-10:00
Phoenix East (Hyatt Regency)
Chairs:
Stefan De Gendt and Paul Raymond Chalker
09:00
989
(Invited) Atomic Layer Deposition of Metals and Oxides on Graphene for Future Nanoelectronics
A. A. Bol, R. H. J. Vervuurt, N. F. W. Thissen, A. Sharma (Eindhoven University of Technology), and W. M. M. Kessels (Eindhoven University of Technology)
09:40
Intermission
See more of: G01: Atomic Layer Deposition Applications 11
See more of: Electronic Materials and Processing
<< Previous Session | Next Session >>